MT661

MATERIALS CHARACTERISATION

 

Pre-requisite:  At least one 600 level course related to materials

Numerical aperture, limit of resolution, depth of field and depth of focus - lens defects and correction- bright field and dark field illumination - polarised light, phase contrast, interference contrast, hot-stage, in-situ techniques, quantitative metallography

Powder, rotating crystal and Laue methods, stereographic projections and reciprocal lattice; X-ray residual stress measurement

Construction and operation of TEM - diffraction effects and image formation, specimen preparation techniques; elemental analysis

by WDS and EDS systems - construction and operation of SEM - analysis of fractured surfaces

X-ray fluoroscopy, spectrometry, Auger spectroscopy, DTA, DSC and TGA, working principle, applications

Stress analysis by strain gauging, high temperature strain gauge technique, photoelasticity and holography

TEXTBOOKS:

1.          Smallman  R. E., ‘Modern Physical Metallurgy’, 4th Edition, Butterworths, 1985

2.          Philips V. A., ‘Modern Metallographic Techniques and their Applications’, Wiley Interscience,1971

3.          Cullity B. D., ‘Elements of X-ray Diffraction’, 4th Edition, Addison Wiley,1978

4.          Loretto M. H., ‘Electron Beam Analysis of Materials’, Chapman and Hall, 1984